Proceedings Papers:
Basim G.B., Metal CMP Optimization Based on Chemically Formed Thin Film Analysis, ECS Transactions, 216th Electrochemical Society Meeting, ULSI Process Integration 6, 25- 7, pp: 315-326, Vol. 25, Issue 7, Vienna, Austria, October 2009.
Basim, G.B., Karagoz, A., Ozdemir, Z., “Advanced Slurry Formulations for New Generation Chemical Mechanical Planarization (CMP) Applications” Proceedings of MRS Spring Meeting, San Francisco, CA, April 2012 (Accepted for Publication).
Basim, G.B., Ozdemir, Z., Karagoz, A., “Evaluation of Cell Growth and Infection Resistance through Micro-Patterning on Biological Implants”, Proceedings of MRS Spring Meeting, San Francisco, CA, April 2012 (Accepted for Publication).
Basim, G.B., Karagoz, A., Ozdemir, Z., “Metal Oxide Nano Film Characterization for CMP Optimization”, Proceedings of ECS Fall Meeting, Honolulu, Hawaii, October 2012 .
Basim, G.B., Karagoz, A., Chen, L., Vakarelski, I., Studies on Slurry Design Fundamentals for Advanced CMP Applications” Proceedings of ECS Fall Meeting, Honolulu, Hawaii, October 2012.
Presentations
Basim G.B., “Metal CMP Optimization Based on Chemically Formed Thin Film Analysis”, ECS 2009 International Meeting, Vienna, Austria, October 2009.
Karagoz A., Basim G.B., “Nano-Scale Protective Oxide Films for Semiconductor and Biomedical Applications”, Biotechnology Congress, Yeditepe University, İstanbul, Turkey, May 2010.
Basim, G.B., Karagoz, A., Ozdemir, Z., “Advanced Slurry Formulations for New Generation Chemical Mechanical Planarization (CMP) Applications” MRS Spring Meeting, San Francisco, CA, April 2012.
Basim, G.B., Ozdemir, Z., Karagoz, A., “Evaluation of Cell Growth and Infection Resistance through Micro-Patterning on Biological Implants”, MRS Spring Meeting, San Francisco, CA, April 2012.
Basim, G.B., Ozdemir, Z., “Biomedical Applications of Chemical Mechanical Planarization Process“, 6th International Conference on Advanced Computational Engineering and Experimenting, Istanbul, Turkey, July 2012 .
Basim, G.B., Karagoz, A., Chen, L. Vakarelski, I.U. “Studies on Slurry Design Fundamentals for Advanced CMP Applications” 222nd ECS Meeting – Honolulu, Hawaii, October 2012.
Basim, G.B., Karagoz, A., Ozdemir Z., “Metal Oxide Nano Film Characterization for CMP Optimization” 222nd ECS Meeting – Honolulu, Hawaii, October 2012-Invited.
Basim G.B., Ozdemir, Z., Mutlu, O., “ Biomaterials Applications of Chemical mechanical Polishing”, International Conference on Planarization/CMP Technology, Grenoble, France, October 2012.
Journal Publications
Basim, G.B. Metal CMP Optimization Based on Chemically Modified Thin Film Analysis. Journal of the Electrochemical Society. (In preparation).
Basim, G.B., and Kincal, S. Control of within die uniformity through layout and selectivity mideling in CMP. Journal of Materials Research. (In preparation).
Karagoz, A., Basim, G.B., Ozdemir, Z. Surfactant tailored particle systems for advanced CMP applications. Journal of the Colloids and Interface science. (In preparation).
Other Related Publications of PI
Proceedings & Presentations
Basim, G.B., Brown, S.C., Vakerelski, I.U., Moudgil, B.M., “Tailoring Silica Nanotribology in Aqueous Environments: A case study on Chemical Mechanical Planarization.” 6th World Particle Congress (WCPT6), Nuremberg, Germany, April 2010.
Basim, G.B., Nanotechnology and Energy, Nanotoxicity and Environment, Advanced Technologies Workshop, Kocaeli, Türkiye, pp. 179, April 2010.
Webb, K.D., Mengüç, M.P, Ertürk, H., Basim G.B., “Technique for Measurement of Near-Field Radiation Heat Transfer Between Parallel Planes with Nano-Scale Spacing”, 14th International Heat Transfer Conference, Antalya, Turkey, June 2010.
Basim, G.B, Kincal, S., “A Model of Chemical Mechanical Planarization to Predict Impact of Pad Conditioning on Process Performance” Proceedings of MRS Spring Meeting, San Francisco, CA, April 2012 (Accepted for Publication).
Kincal, S., Basim, G.B, ”A Modeling Study on the Layout Impact of with-in-die Thickness Range for STI CMP” 222nd ECS Meeting – Honolulu, Hawaii, October 2012.
Journal Publications
Vakarelski I. U., Brown, S.C, Basim G.B, Rabinovich, Y. I., and Moudgil B.M., “Tailoring Silica Nanotribology for CMP Slurry Optimization: Ca2+ Cation Competition in C12TAB Mediated Lubrication”, ACS Applied Materials & Interfaces, Vol. 2, No 4, pp. 1228-1235, 2010.
Basim, G.B., “Effect of Slurry Aging on Stability and Performance of Chemical Mechanical Planarization Process”, Advanced Powder Technology, Vol. 22, pp. 257-265, 2011.
Basim G.B., Kincal S., “Impact of Pad Conditioning on Thickness Profile Control in Chemical Mechanical Planarization,” Journal of Electronic Materials (submitted for publication).
Books
Basim G.B., Engineered Particulate Systems for Chemical Mechanical Planarization, Lambert Academic Publishing, ISBN 978-3-8433-6346-4, 2011.
Patents
Basim, G.B, Kincal, S., Davis, E., “Predictive Method to Improve within Wafer CMP Uniformity through Optimized Pad Conditioning” US Pat. 7,899,571. Granted March 1, 2011.